Reducing SU-8 hygroscopic swelling by ultrasonic treatment
نویسندگان
چکیده
منابع مشابه
Thermal UV treatment on SU-8 polymer for integrated optics
We report a simple and low-cost method to fabricate SU-8-based polymer waveguide devices. The influence of hard-baking temperature on SU-8 polymer treated with or without UV radiation was investigated in detail. Based on these properties, the straight type, Y branch type, MarchZehnder (M-Z) type and 1 × 4 splitter waveguides were successfully fabricated. And a polymeric thermal-optic (TO) switc...
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Some studies on the fabrication of micro-needles, micro-pillers, and micro-channels using SU-8 negative photoresist for MEMS and bio-applications are reported. The SU-8 processing technology was standardized for the purpose. Micro-pillars were fabricated on SU-8 polymer by soft lithographic technique. Micro-needles were realized on SU-8 film utilizing lensing effect of the etched groove structu...
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SU-8 can be patterned with high resolution, is flexible and tough. These characteristics qualify SU-8 as a material for making spotting pins for printing DNA and protein microarrays, and it can potentially replace the commonly used silicon and steel pins that are expensive, brittle in the case of silicon and can damage the substrate during the printing process. SU-8, however, accumulates large ...
متن کاملLarge-format fabrication by two-photon polymerization in SU-8
Microporous structures are central to many fields of science and engineering, but many of these systems are complex with little or no symmetry and are difficult to fabricate. We applied two-photon polymerization (2PP) and femtosecond laser direct-writing techniques to fabricate broadarea large-format 3D microporous structures (450 μm × 450 μm × 40 μm) in the epoxy-based photoresist SU-8. The ap...
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In this work, three-dimensional 3D SU-8 microand nanostructures were fabricated using a reversal UV imprint process at low temperature and low pressure. The SU-8 polymer was coated on a patterned glass mold and then transferred onto various substrates by reversal UV imprint at a typical temperature of 50 °C, pressure of 1 MPa, and UV exposure of 1 s. The lower temperature and pressure used comp...
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ژورنال
عنوان ژورنال: Nano-Micro Letters
سال: 2010
ISSN: 2311-6706,2150-5551
DOI: 10.1007/bf03353641